Effect of Flow Rate, Nitrogen Precursor and Diluent on Si2N2O Deposition by HYSYCVD

A.L. Leal-Cruz, M.I. Pech-Canul, E. Lara-Curzio, R.M. Trejo, R. Peascoe

Producción científica: Informe/libro › Libro › revisión exhaustiva

Acceder al documento

TY - BOOK

T1 - Effect of Flow Rate, Nitrogen Precursor and Diluent on Si2N2O Deposition by HYSYCVD

AU - Leal-Cruz, A.L.

AU - Pech-Canul, M.I.

AU - Lara-Curzio, E.

AU - Trejo, R.M.

AU - Peascoe, R.

PY - 2009

Y1 - 2009

UR - http://www.scopus.com/inward/record.url?eid=2-s2.0-84955410339&partnerID=MN8TOARS

U2 - 10.1002/9780470522189.ch4

DO - 10.1002/9780470522189.ch4

M3 - Libro

BT - Effect of Flow Rate, Nitrogen Precursor and Diluent on Si2N2O Deposition by HYSYCVD

ER -