Effects of Plasma Pretreatment on ZnO Deposition by SILAR on SiO<inf>2</inf>, HfO<inf>2</inf>, and Glass Substrates

Marissa Higgins, Maria Isabel Pintor-Monroy, Manuel Quevedo-Lopez

Resultado de la investigación: Contribución a una revistaArtículoInvestigaciónrevisión exhaustiva

Idioma originalInglés estadounidense
PublicaciónCrystal Research and Technology
DOI
EstadoPublicada - 1 ago 2018
Publicado de forma externa

Huella dactilar

Zinc Oxide
Zinc oxide
zinc oxides
pretreatment
Plasmas
Adsorption
Glass
adsorption
glass
Substrates
Hafnium oxides
Oxide films
hafnium oxides
oxide films
Silicon oxides
oxygen plasma
silicon oxides
Hafnium
Oxygen
hafnium

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@article{4b36b92b869c4a57833361c4c1c1ad6c,
title = "Effects of Plasma Pretreatment on ZnO Deposition by SILAR on SiO2, HfO2, and Glass Substrates",
author = "Marissa Higgins and Pintor-Monroy, {Maria Isabel} and Manuel Quevedo-Lopez",
year = "2018",
month = "8",
day = "1",
doi = "10.1002/crat.201800039",
language = "American English",
journal = "Crystal Research and Technology",
issn = "0232-1300",
publisher = "John Wiley and Sons Inc.",

}

Effects of Plasma Pretreatment on ZnO Deposition by SILAR on SiO<inf>2</inf>, HfO<inf>2</inf>, and Glass Substrates. / Higgins, Marissa; Pintor-Monroy, Maria Isabel; Quevedo-Lopez, Manuel.

En: Crystal Research and Technology, 01.08.2018.

Resultado de la investigación: Contribución a una revistaArtículoInvestigaciónrevisión exhaustiva

TY - JOUR

T1 - Effects of Plasma Pretreatment on ZnO Deposition by SILAR on SiO2, HfO2, and Glass Substrates

AU - Higgins, Marissa

AU - Pintor-Monroy, Maria Isabel

AU - Quevedo-Lopez, Manuel

PY - 2018/8/1

Y1 - 2018/8/1

U2 - 10.1002/crat.201800039

DO - 10.1002/crat.201800039

M3 - Article

JO - Crystal Research and Technology

JF - Crystal Research and Technology

SN - 0232-1300

ER -