Electrical transport characterization of Al and Sn doped Mg2Si thin films

Bo Zhang, Tao Zheng, Ce Sun, Zaibing Guo, Moon J. Kim, Husam N. Alshareef, Manuel Quevedo-Lopez, Bruce E. Gnade*

*Autor correspondiente de este trabajo

Producción científica: Contribución a una revistaArtículorevisión exhaustiva

8 Citas (Scopus)

Resumen

Thin-film Mg2Si was deposited using radio frequency (RF) magnetron sputtering. Al and Sn were incorporated as n-type dopants using co-sputtering to tune the thin-film electrical properties. X-ray diffraction (XRD) analysis confirmed that the deposited films are polycrystalline Mg2Si. The Sn and Al doping concentrations were measured using Rutherford backscattering spectroscopy (RBS) and energy dispersive X-ray spectroscopy (EDS). The charge carrier concentration and the charge carrier type of the Mg2Si films were measured using a Hall bar structure. Hall measurements show that as the doping concentration increases, the carrier concentration of the Al-doped films increases, whereas the carrier concentration of the Sn-doped films decreases. Combined with the resistivity measurements, the mobility of the Al-doped Mg2Si films is found to decrease with increasing doping concentration, whereas the mobility of the Sn-doped Mg2Si films is found to increase.

Idioma originalInglés
Páginas (desde-hasta)156-160
Número de páginas5
PublicaciónJournal of Alloys and Compounds
Volumen720
DOI
EstadoPublicada - 2017
Publicado de forma externa

Nota bibliográfica

Publisher Copyright:
© 2017 Elsevier B.V.

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