Influence of annealing temperature on nickel oxide thin films grown by chemical bath deposition

M. Martínez-Gil, M. I. Pintor-Monroy, M. Cota-Leal, D. Cabrera-German, A. Garzon-Fontecha, M. A. Quevedo-López, M. Sotelo-Lerma

Resultado de la investigación: Contribución a una revistaArtículoInvestigaciónrevisión exhaustiva

7 Citas (Scopus)
Idioma originalInglés estadounidense
Páginas (desde-hasta)37-45
Número de páginas9
PublicaciónMaterials Science in Semiconductor Processing
DOI
EstadoPublicada - 1 dic 2017

Huella dactilar

Nickel oxide
nickel oxides
Oxide films
baths
Ionization potential
Annealing
Thin films
annealing
Energy gap
thin films
Nickel sulfates
Triethanolamine
ionization
worms
Hall effect
Photoelectron spectroscopy
Temperature
Diffraction patterns
temperature
sulfates

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Martínez-Gil, M., Pintor-Monroy, M. I., Cota-Leal, M., Cabrera-German, D., Garzon-Fontecha, A., Quevedo-López, M. A., & Sotelo-Lerma, M. (2017). Influence of annealing temperature on nickel oxide thin films grown by chemical bath deposition. Materials Science in Semiconductor Processing, 37-45. https://doi.org/10.1016/j.mssp.2017.09.021
Martínez-Gil, M. ; Pintor-Monroy, M. I. ; Cota-Leal, M. ; Cabrera-German, D. ; Garzon-Fontecha, A. ; Quevedo-López, M. A. ; Sotelo-Lerma, M. / Influence of annealing temperature on nickel oxide thin films grown by chemical bath deposition. En: Materials Science in Semiconductor Processing. 2017 ; pp. 37-45.
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Influence of annealing temperature on nickel oxide thin films grown by chemical bath deposition. / Martínez-Gil, M.; Pintor-Monroy, M. I.; Cota-Leal, M.; Cabrera-German, D.; Garzon-Fontecha, A.; Quevedo-López, M. A.; Sotelo-Lerma, M.

En: Materials Science in Semiconductor Processing, 01.12.2017, p. 37-45.

Resultado de la investigación: Contribución a una revistaArtículoInvestigaciónrevisión exhaustiva

TY - JOUR

T1 - Influence of annealing temperature on nickel oxide thin films grown by chemical bath deposition

AU - Martínez-Gil, M.

AU - Pintor-Monroy, M. I.

AU - Cota-Leal, M.

AU - Cabrera-German, D.

AU - Garzon-Fontecha, A.

AU - Quevedo-López, M. A.

AU - Sotelo-Lerma, M.

PY - 2017/12/1

Y1 - 2017/12/1

U2 - 10.1016/j.mssp.2017.09.021

DO - 10.1016/j.mssp.2017.09.021

M3 - Article

SP - 37

EP - 45

JO - Materials Science in Semiconductor Processing

JF - Materials Science in Semiconductor Processing

SN - 1369-8001

ER -

Martínez-Gil M, Pintor-Monroy MI, Cota-Leal M, Cabrera-German D, Garzon-Fontecha A, Quevedo-López MA y otros. Influence of annealing temperature on nickel oxide thin films grown by chemical bath deposition. Materials Science in Semiconductor Processing. 2017 dic 1;37-45. https://doi.org/10.1016/j.mssp.2017.09.021