Stability of Cesium-Based Lead Halide Perovskites under UV Radiation

Zhiyang Qin, Jesus Alfonso Caraveo-Frescas, Leunam Fernandez-Izquierdo, M. Josefina Arellano-Jimenez, Francisco S. Aguirre-Tostado, Martin Gregorio Reyes-Banda, Manuel A. Quevedo-Lopez*

*Autor correspondiente de este trabajo

Producción científica: Contribución a una revistaArtículorevisión exhaustiva

Resumen

Lead halide perovskites have been extensively studied for their potential applications, including photodetectors, solar cells, and high-energy radiation detection. These applications are possible because of their unique optoelectronic properties, such as tunable band gap, high optical absorption coefficient, and unique defect self-healing properties, which result in high defect tolerance. Despite these advantages, the long-term stability remains a critical issue that could hinder commercial applications of these materials. Reports on the stability of lead halide perovskites for optoelectronic applications have normally focused on methylammonium (MA)/formamidinium (FA), with very limited information for other systems, in particular, Cs-containing perovskites. In this paper, we report the stability of thick CsPbBr3-xClx polycrystalline thin films (∼8 μm) with several halide Br-Cl ratios after exposure to deep UV radiation. The chemical, crystal structure, optical, and electrical properties are analyzed, and the results are used to propose a degradation mechanism. The chemical analysis on the surface and bulk of the films indicates the formation of cesium oxide after UV exposure, with no significant change in the crystalline structure. The proposed mechanism explains the formation of cesium oxides during UV exposure. The I-V characteristics of diode structures also showed significant degradation after UV exposure, primarily at lower diode rectification ratios. The mechanism proposed in this paper can contribute to developing strategies to enhance the long-term stability of inorganic lead halide perovskites under UV exposure.

Idioma originalInglés
Páginas (desde-hasta)26683-26691
Número de páginas9
PublicaciónACS Omega
Volumen9
N.º24
DOI
EstadoPublicada - 18 jun. 2024

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Publisher Copyright:
© 2024 The Authors. Published by American Chemical Society.

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