Ingeniería y ciencia de los materiales
Atomic layer deposition
100%
Refractive index
85%
Spectroscopic ellipsometry
71%
Alumina
64%
Aluminum oxide
62%
Purging
36%
Amorphous films
21%
Ultrathin films
21%
X ray photoelectron spectroscopy
15%
Optoelectronic devices
15%
Film thickness
14%
Crystalline materials
13%
Thin films
12%
Nitrogen
12%
Wavelength
11%
Temperature
10%
Scanning electron microscopy
10%
Silicon
10%
Carbon
9%
Substrates
9%
Física y astronomía
atomic layer epitaxy
67%
aluminum oxides
53%
refractivity
45%
purging
32%
ellipsometry
31%
cycles
21%
homogeneity
20%
surface reactions
11%
roughness
8%
photoelectron spectroscopy
8%
film thickness
8%
nitrogen
7%
reflectance
7%
carbon
7%
scanning electron microscopy
7%
temperature
6%
silicon
5%
thin films
5%
pulses
5%
wavelengths
5%
x rays
4%
Química
Atomic Layer Epitaxy
75%
Refractive Index
62%
Ellipsometry
35%
Liquid Film
31%
Homogeneity
19%
Ultrathin Film
13%
Surface Reaction
11%
Optoelectronics
9%
Dielectric Material
9%
Wavelength
7%
X-Ray Photoelectron Spectroscopy
7%
Amorphous Material
7%
Surface
6%
Nitrogen
6%
Scanning Electron Microscopy
6%
Time
3%
Application
3%