Structure and refractive index of thin alumina films grown by atomic layer deposition

Keyphrases

• Refractive Index 100%
• Atomic Layer Deposition 100%
• Alumina Film 100%
• Structure Index 100%
• Spectroscopic Ellipsometry 50%
• Aluminum Oxide 33%
• Growth Rate 16%
• Silicon Substrate 16%
• Scanning Electron Microscope Image 16%
• Wavelength Range 16%
• Optoelectronic Applications 16%
• Dielectric Materials 16%
• X-ray Photoelectron Spectroscopy Analysis 16%
• Trimethylaluminum 16%
• Deposition Temperature 16%
• Surface Reaction 16%
• N2 Purging 16%
• Al2O3 Oxide 16%
• Nitrogen Purging 16%
• N-value 16%
• Moderate Temperature 16%
• Film Thickness 16%
• Al2O3 Thin Films 16%
• Depositional Cycle 16%
• Purge Time 16%
• Optical Reflectance 16%
• Film Surface 16%
• Ultrathin Films 16%

Engineering

• Refractive Index 100%
• Refractivity 100%
• Atomic Layer Deposition 100%
• Aluminum Oxide 100%
• Deposited Film 33%
• Silicon Substrate 16%
• Dielectrics 16%
• Thin Films 16%
• Optoelectronics 16%
• Ray Photoelectron Spectroscopy 16%
• Reflectance 16%
• Good Match 16%
• Moderate Temperature 16%
• Deposition Temperature 16%
• Film Surface 16%

Material Science

• Film 100%
• Refractive Index 100%
• Aluminum Oxide 100%
• Surface (Surface Science) 28%
• X-Ray Photoelectron Spectroscopy 14%
• Silicon 14%
• Dielectric Material 14%
• Scanning Electron Microscopy 14%
• Thin Films 14%
• Film Deposition 14%
• Surface Reaction 14%
• Film Thickness 14%
• Ultrathin Film 14%